Kelin J. Kuhn is an Intel Fellow, Technology and Manufacturing Group and director of Logic Device Technology. Kuhn is the device lead of the pathfinding team. Kelin Kuhn of Oregon State University, Oregon (OSU) with expertise in: Experimental Physics, Atomic, Molecular and Optical Physics and Solid State Physics. Dr. Kuhn received her B.S. in Electrical Engineering from the University of Washington, Seattle, WA (magna cum laude) in and the M.S. and Ph.D. in.
|Published (Last):||17 February 2018|
|PDF File Size:||8.43 Mb|
|ePub File Size:||12.84 Mb|
|Price:||Free* [*Free Regsitration Required]|
Shopbop Designer Fashion Brands. Amazon Restaurants Food delivery from local restaurants. And it allowed her kelib learn to play the Irish jigs and reels she loves.
Women In Tech: Award Winning Chip Scientist Kelin Kuhn
Laser Engineering by Kelin J. The embodiments herein reduce an external parasitic resistance of the device. Kuhn was the device lead for Intel’s 45nm kein, which uses Hi-K metal gate transistors and represents the most significant change in transistor architecture in the past 40 years. The Fannie and John Hertz Foundation is a not-for-profit organization c 3. She has five patents with five others pending and is the author of more than 60 technical papers and a textbook.
,uhn and apparatus to reduce layout based strain kuhh in non-planar transistor structures. Get to Know Us. The source region or the drain region, or combinations thereof, comprise a metal layer formed on the substantially all of the first side surface, substantially all lelin the second side surface, and the top surface. So the class was created to illustrate this, involving companies and consumer products of that era such as VCRs, DVD players and tape recorders — often obtained from local pawn shops.
Only 1 left in stock more on the way. Giles, Kelin Kuhn, Jack T.
The nanowire has an anchored portion and a suspended portion. Get fast, free shipping with Amazon Prime. Kuhn uses an analogy to explain the move. Withoutabox Submit to Film Festivals.
Kuhn is the device lead of the pathfinding team responsible for the transistor architecture for Muhn 22 nanometer nm process technology. Kuhn joined Intel in as a front-end integration engineer working on Intel’s 0.
As the formation of the highly doped underlayer may result in gate inducted drain leakage at an interface between source structures and drain structures of the nanowire transistors, a thin layer of undoped or low doped material may be formed between the highly doped underlayer and the nanowire transistors.
After hearing an Oregon neurologist lecture on the power of learning a musical instrument to keep the brain sharp, Kuhn was intrigued. In at least one embodiment, the present disclosure relates to forming isolation structures in strained semiconductor bodies of non-planar transistors while maintaining strain in the semiconductor bodies. I need to go to a new chapter.
Are you an author? Methods of forming low band gap source and drain structures in microelectronic devices. Nanowire-based mechanical switching device. Leaving tenure behind… Inafter a decade at the University of Washington, Kuhn left her tenured position as kjhn associate professor of electrical and computer engineering to join Intel.
ComiXology Thousands of Digital Comics. Kuhn began flying as a distraction from work but soon realized it was a terrific way to augment her lifelong love of geology and rock collecting. Stephen M Cea, Martin D. Only 3 left in stock – order soon.
That experience largely dropped out of the culture by the time she started her faculty position in due to the widespread use of integrated circuits, which made the underlying technology all but invisible.
Help us improve our Author Pages by updating your kelij and submitting a new or current image and biography. Amazon Drive Cloud storage from Amazon. The underlayer etch stop may prevent damage to the source structures andor drain the structures, when the material used in the fabrication of the kunn structures andor the drain structures is susceptible to being etched by the processes used in the removal of the sacrificial materials, i.
A first gate electrode is disposed adjacent the void, and is spaced apart from the nanowire. The first side surface is opposite the second side surface, the top surface is opposite the bottom surface. Low to High Price: Kuhn earned her bachelor’s degree in electrical engineering from the University of Washington in It used to be, Kuhn explained, that a kid kuh tear apart a consumer electronic device — a radio, for example — and the function of every piece could be understood.
The semiconductor body comprises a source region; and a drain region. East Dane Designer Men’s Fashion. Amazon Advertising Find, attract, and engage customers. For example, a nanowire relay includes a nanowire disposed in a void disposed above a substrate.
Kelin J. Kuhn
High to Low Avg. Kelin Kuhn has filed for patents to protect the following inventions. English Choose a language for shopping. Some facts about Kuhn: